Journal of Engineering Physics and Thermophysics
is a translation of Inzhenerno-fizicheskii Zhurnal,
a publication of the Academic Scientific Complex
"A. V. Luikov Heat and Mass Transfer Institute"
of the National Academy of Sciences of Belarus
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MODELING OF ION-IMPLANTED ARSENIC DIFFUSION
IN A POLYSILICON-SILICON SYSTEM
O. I. Velichko , F. F. Komarov ,
N. M. Lukanov , A. N. Muchinskii ,
N. L. Prokhorenko , and V. A. Tsurko
UDC 681.3+519.6
A model of transfer processes of impurity atoms in a
polysilicon-silicon system which describes the
segregation of the impurity at the phase boundary is
constructed. An algorithm is developed and numerical
calculations are made for arsenic diffusion with
allowance for a nonuniform defect distribution at
the phase boundary.
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