PURPOSE AND KEY FEATURESIt is designed for electron microscopic preparation operations connected with the spraying of materials in vacuum, and can also be used for metallization of materials in vacuum, heating and cooling of the samples under study, purification of samples and spraying of materials by means of ion bombardment.
Residual pressure in the working volume when the trap is cooled with water: 1.3 * 10-3 Pa
Residual pressure in the working volume when the trap is cooled with liquid nitrogen: 1.3 * 10-4 Pa
Maximum filling pressure of hydrogen: 2.5 MPa
Current of evaporators: up to 200 A
Voltage at the output of a high-voltage rectifier without load: 10 kV
Maximum glow discharge current: 50 mA
Year of commissioning: 2011