CONTROL OF THE PROPERTIES OF THIN-FILM SYSTEMS WITH THE USE OF PULSED PHOTON TREATMENTV. A. Pilippenko, V. N. Ponomar', and V. A. Gorushko UDC 621.3.049.77.621.373.826 We have developed a radically new technological process of making very large-scale integrated circuits, which has no analogs and is based on the use of fast heat treatments for forming gettering layers, silicon oxidation, annealing of ion-doped layers, fusion of phosphoro- and borophosphorosilicate glasses, forming silicides, and increasing the thermostability of aluminum metallization. Unitary Enterprise "Belmikrosistemy," Scientific-Production Association "Integral," Minsk, Belarus. Translated from Inzhenerno-Fizicheskii Zhurnal, Vol. 76, No. 4, pp. 95-98, July-August, 2003. Original article submitted October 10, 2002.